Relationship between remaining solvent and acid diffusion in chemically amplified deep ultraviolet resists

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6501-6505

  Itani, Toshiro ^a   Yoshino, Hiroshi ^a   Hashimoto, Shuichi ^a   Yamana, Mitsuharu ^a   Samoto, Norihiko ^a   Kasama, Kunihiko ^a  

^a NEC CORPORATION   (Japan)

Author keywords

Acid diffusion reaction; Blocking level; Chemically amplified resist; Prebake temperature; Remaining solvent

Indexed keywords

EID: 0000125484     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6501     Document Type: Article

References (12)

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