Diffusion of photoacid generators by laser scanning confocal microscopy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 794-805

  Zhang, Ping ^b,c   Webber, Stephen E ^a   Mendenhall, J ^a   Byers, Jeff D ^c   Chao, Keith K ^b,c  

^a The University of Texas at Austin   (United States)

^b SEMATECH   (United States)

^c R and D   (United States)

Author keywords

Diffusion; Diffusion constant; DUV; Laser scanning confocal microscope; PAG

Indexed keywords

ACIDS; CONFOCAL MICROSCOPY; DIFFUSION; FLUORESCENCE; IMAGE RESOLUTION; LASERS; LAWS AND LEGISLATION; MANGANESE; MANGANESE COMPOUNDS; MERCURY (METAL); MICROMETERS; OXIDE MINERALS; PHOTORESISTORS; PHOTORESISTS; QUARTZ; REFLECTION; REFRACTIVE INDEX; SCANNING; SURFACE STRUCTURE; THICKNESS MEASUREMENT;

ACID DIFFUSIONS; ADOBE PHOTOSHOP; BULK STRUCTURES; CHEMICALLY AMPLIFIED PHOTORESISTS; CONTRAST LOSS; DEPTH RESOLUTIONS; DIFFUSION COEFFICIENTS; DIFFUSION CONSTANT; DUV; EXCHANGE RATES; EXCITATION WAVELENGTHS; FLUORESCENCE IMAGES; FOCAL POINTS; HIGH TEMPERATURES; IODONIUM; LASER SCANNING CONFOCAL MICROSCOPE; LASER-SCANNING CONFOCAL MICROSCOPIES; LATENT IMAGES; LATERAL PLANES; LENGTH SCALE; NIH IMAGE SOFTWARES; PAG; PEB TEMPERATURES; PH SENSITIVES; PHOTO ACID GENERATORS; PHOTO GENERATIONS; POLYHYDROXYSTYRENE; POST EXPOSURES; QUARTZ DISKS; REFLECTANCE IMAGES; SECOND FICK'S LAWS; SILICON SUBSTRATES; SPATIAL RESOLUTIONS; SPIN CASTS; SURFACE LAYERS; VERTICAL POSITIONS; VOLUME ELEMENTS;

THREE DIMENSIONAL;

EID: 0000360998     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312397     Document Type: Conference Paper

References (5)

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