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Volumn 3412, Issue , 1998, Pages 350-357

Fabrication and commercialization of SCALPEL masks

Author keywords

CD metrology; Defect inspection; Electron beam lithography

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLOGRAPHY; ETCHING; INSPECTION; INTEGRATED CIRCUIT MANUFACTURE; MAGNETRON SPUTTERING; MASKS; OPTICAL MICROSCOPY; PHOTORESISTS; SILICON NITRIDE; SILICON WAFERS;

EID: 0004548773     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.328847     Document Type: Conference Paper
Times cited : (8)

References (9)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.