Direct simulation monte carlo analysis of flows and etch rate in an inductively coupled plasma reactor

IEEE Transactions on Plasma Science

Volumn 27, Issue 5, 1999, Pages 1379-1388

  Nanbu, Kenichi ^a   Morimoto, Tamotsu ^a   Suetani, Masaharu ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Etch rate prediction; Inductively coupled plasma; Particle simulation; Rarefied flow

Indexed keywords

CHEMICAL REACTORS; CHLORINE; COMPUTER SIMULATION; MONTE CARLO METHODS; PLASMA ETCHING; PLASMA FLOW; PROBABILITY; SILICON WAFERS;

INDUCTIVELY COUPLED PLASMA REACTORS;

PLASMA DEVICES;

EID: 0033204125     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.799816     Document Type: Article

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