Growth of continuous and highly (100)-oriented β-FeSi2 films on Si(001) from Si/Fe multilayers with SiO2 capping and templates

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 8 A, 1999, Pages

  Suemasu, Takashi ^a   Hiroi, Noriyoshi ^a   Fujii, Tetsuo ^a   Takakura, Ken'ichiro ^a   Hasegawa, Fumio ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ANNEALING; CRYSTAL ORIENTATION; DEPOSITION; FILM GROWTH; IRON; MULTILAYERS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SILICA; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

CAPPING; ELECTRON IMPACT EMISSION SPECTROSCOPY; REACTIVE DEPOSITION EPITAXY; TEMPLATES;

SEMICONDUCTING FILMS;

EID: 0033172251     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l878     Document Type: Article

References (18)

1. D. Leong, M. Harry, K. J. Reeson and K. P. Homewood: Nature 387 (1997) 686.
2. K. Lefki and P. Muret: J. Appl. Phys. 74 (1993) 1138.
3. W. Z. Shen, W. G. Tang, Z. Y. Li, S. C. Shen and L. W. Wang: Phys. Status Solidi B 187 (1995) 511.
4. Y. Maeda, T. Akita, K. Umezawa, K. Miyake and M. Sagawa: Proc. SPIE 3419 (1998) 354.
5. M. C. Bost and J. E. Mahan: J. Appl. Phys. 58 (1985) 2696.
6. N. Cherief, C. D'Anterroches, R. C. Cinti, T. A. N. Tan and J. Derrien: Appl. Phys. Lett. 55 (1989) 1671.
7. K. Radermacher, R. Carius and S. Mantl: Nucl. Instrum. & Methods B 84 (1994) 163.
8. C. A. Dimitriadis, J. H. Werner, S. Logothetidis, M. Stutzmann, J. Weber and R. Nesper: J. Appl. Phys. 68 (1990) 1726.
9. H. Lange: Phys. Status Solidi B 201 (1997) 3.
10. J. E. Mahan, K. M. Geib, G. Y. Robinson, R. G. Long, X. Yan, G. Bai, M. A. Nicolet and M. Nathan: Appl. Phys. Lett. 56 (1990) 2126.
11. L. Wang, L. Qin, Y. Zheng, Q. Shen, X. Chen, X. Lin, C. Lin and S. Zou: Appl. Phys. Lett. 65 (1994) 3105.
12. K. M. Geib, J. E. Mahan, R. G. Long, M. Nathan and G. Bai: J. Appl. Phys. 70 (1991) 1730.
13. M. Tanaka, Y. Kumagai, T. Suemasu and F. Hasegawa: Jpn. J. Appl. Phys. 36 (1997) 3620.
14. C. Lin, L. Wang, X. Chen, L. F. Chen and L. M. Wang: Jpn. J. Appl. Phys. 37 (1998) 622.
15. T. Suemasu, Y. Iikura, T. Fujii, K. Takakura, N. Hiroi and F. Hasegawa: Jpn. J. Appl. Phys. 38 (1999) L620.
16. T. Suemasu, M. Tanaka, T. Fujii, S. Hashimoto, Y. Kumagai and F. Hasegawa: Jpn. J. Appl. Phys. 36 (1997) L1225.
17. M. Watanabe, S Muratake, T. Suemasu, H. Fujimoto, S. Sakamori, M. Asada and S. Arai: J. Electr. Mater. 21 (1992) 783.
18. T. Suemasu, T. Fujii, M. Takakura, Y. Iikura and F. Hasegawa: J. Lumin. 80 (1999) 473.