Low-Pressure Etching of Nanostructures and Via Holes Using an Inductively Coupled Plasma System

Journal of the Electrochemical Society

Volumn 146, Issue 2, 1999, Pages 775-779

  Berg, E W ^a   Pang, S W ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ETCHING; MASKS; MIRRORS; NANOSTRUCTURED MATERIALS; PLASMA SOURCES; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE;

BRAGG REFLECTORS; INDUCTIVELY COUPLED PLASMA SOURCE; LOW PRESSURE ETCHING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033076939     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391680     Document Type: Article

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