Patterned polymer multilayers as etch resists

Langmuir

Volumn 15, Issue 20, 1999, Pages 6862-6867

  Huck, Wilhelm T S ^a   Yan, Lin ^a   Stroock, Abe ^a   Haag, Rainer ^a   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC BREAKDOWN OF SOLIDS; ELLIPSOMETRY; ETCHING; GOLD; INFRARED SPECTROSCOPY; MULTILAYERS; SILICONES; SILVER; SYNTHESIS (CHEMICAL);

ETCH RESISTS; SELF-ASSEMBLED MONOLAYERS (SAM);

PLASTIC FILMS;

EID: 0032685679     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la990374+     Document Type: Article

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