Microlithographic process for patterning conjugated emissive polymers

Advanced Materials

Volumn 9, Issue 5, 1997, Pages 392-395

  Renak, Michelle L ^a   Bazan, Guillermo C ^a   Roitman, Daniel ^b  

^a UNIVERSITY OF ROCHESTER   (United States)

^b HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT LAYOUT; LIGHT EMITTING DIODES; PHOTOLITHOGRAPHY; SYNTHESIS (CHEMICAL);

CONJUGATED EMISSIVE POLYMERS; ORGANIC LIGHT EMITTING DIODES;

SEMICONDUCTING POLYMERS;

EID: 0031118085     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.19970090505     Document Type: Article

References (23)

1. J. R. Sheats, H. Antoniadis, M. Hueschen, W. Leonard, J. Miller, R. Moon, D. Roitman, A. Stocking, Science 1996, 273, 884.
2. J. H. Burroughes, D. D. C. Bradley, A. R. Brown, R. N. Marks, K. Mackay, R. H. Friend, P. L. Burns, A. B. Holmes, Nature 1990, 347, 539.
3. a) A. J. Heeger, Y. Yang, Appl. Phys. Lett. 1994, 64, 1245.
4. b) P. Broms, N. Birgersson, N. Johansson, M. Logdlund, W. R. Salaneck, Synth. Met. 1995, 74, 179.
5. M. Onoda, K. Yoshino, J. Appl. Phys. 1995, 78, 4456.
6. N. C. Greenham, S. C. Moratti, D. D. C. Bradley, R. H. Friend, A. B. Holmes, Nature 1993, 365, 628.
7. G. Gustafsson, Y. Cao, G. M. Treacy, F. Klavetter, N. Colaneri, A. J. Heeger, Nature 1992, 357, 477.
8. E. Westerweele, P. Smith, A. J. Heeger, Adv. Mater. 1995, 7, 788.
9. M. Granstrom, M. Berggren, O. Inganäs, Science 1995, 267, 1479.
10. E. Reichmanis, L. F. Thompson, Chem. Rev. 1989, 89, 1273.
11. Y-J. Miao, G. C. Bazan, J. Am. Chem. Soc. 1994, 116, 9379.
12. a) R. A. Wessling, J. Polym. Sci., Part C: Polym. Symp. 1985, 72, 55.
13. b) P. L. Burn, D. D. C. Bradley, A. R. Brown, R. H. Friend, A. B. Holmes, Synth. Met. 1991, 41-43, 261.
14. c) P. L. Burn, D. D. C. Bradley, R. H. Friend, D. A. Halliday, A. B. Holmes, R. W. Jackson, A. Kraft, J. Chem. Soc., Perkin Trans. 1992, 1, 3225.
15. G. C. Bazan, Y-J. Miao, M. L. Renak, B. J. Sun, J. Am. Chem. Soc. 1996, 11, 2618.
16. S. A. MacDonald, C. G. Willson, J. M. Frechet, Acc. Chem. Res. 1994, 27, 151.
17. J. L. Dektar, N. P. Hacker, J. Am. Chem. Soc. 1990, 112, 6004.
18. N. C. Greenham, R. H. Friend, in Solid State Physics, Vol. 49 (Eds: H. Ehrenreich, F. Spaepen), Academic Press, San Diego, CA 1995, pp. 1-149.
19. 25. The continuous film was not washed in the chloroform developer.
20. D. B. Roitman, W. Leonard, H. Antoniadis, M. Hueschen, Proc. Soc. for Imaging Science and Technology, 49th Annu. Conf. The Society for Imaging Science and Technology, Springfield, VA 1996, p. 414.
21. L. F. Thompson, in Introduction to Microlithography, 2nd ed. (Eds: L. F. Thompson, C. G. Willson, M. J. Bowden), Am. Chem. Soc., Washington, DC 1994, p. 300.
22. Fine linear structures have also been created from PPV by writing a holographic grating of two laser beams onto a precursor film. See: W. Schmid, R. Dankesreiter, J. Gmeiner, T. Vogtman, M. Schwoerer, Acta Polym. 1993, 44, 208.
23. F. Michelotti, T. Gabler, H. Horhold, R. Waldhausl, A. Brauer, Opt. Commun. 1995, 114, 247.