Overlay error due to lens coma and asymmetric illumination dependence on pattern feature

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 199-210

  Nomura, Hiroshi ^a   Sato, Takashi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Coma aberration; Illumination optics; Overlay inspection; Photolithography; Zernike's polynomials

Indexed keywords

DIFFRACTION; LENSES; LIGHT INTERFERENCE; PHOTORESISTS; POLYNOMIALS;

COMA ABERRATION;

ABERRATIONS;

EID: 0032401383     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308728     Document Type: Conference Paper

References (6)

1. The challenge of 1-gigabit DRAM development when using optical lithography
2. Effect of variable sigma aperture on lens distortion and its pattern size dependence
3. Pattern deformation induced from intensity-unbalanced off-axis illumination
4. Towards a comprehensive control of full-field image quality in optical photolithography