Hybrid finite element-finite difference method for thermal analysis in x-ray lithography

International Journal of Numerical Methods for Heat and Fluid Flow

Volumn 9, Issue 6, 1999, Pages 660-676

  Dai, W ^a   Nassar, R ^a  

^a Louisiana Tech University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE DIFFERENCE METHOD; FINITE ELEMENT METHOD; MAGNETIC FLUX; MASKS; MULTILAYERS; NUMERICAL METHODS; PHOTORESISTS; SUBSTRATES; TEMPERATURE DISTRIBUTION; THERMAL EFFECTS; THERMAL EXPANSION; THERMOANALYSIS;

DOMAIN DECOMPOSITION ALGORITHM; GAUSSIAN ELIMINATION; POTENTIAL TEMPERATURE; X RAY IRRADIATION;

X RAY LITHOGRAPHY;

EID: 0032593087     PISSN: 09615539     EISSN: None     Source Type: Journal    
DOI: 10.1108/09615539910276160     Document Type: Article

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