Temperature rise in thick PMMA resists during x-ray exposure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2880, Issue , 1996, Pages 183-190

  Manohara, Harish M ^a   Calderon, Gina ^a   Klopf, J Michael ^a   Morris, Kevin J ^a   Vladimirsky, Olga ^a   Vladimirsky, Yuli ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GOLD; MICROLITHOGRAPHY; PHOTORESISTS; POLYMETHYL METHACRYLATES; TEMPERATURE MEASUREMENT; THERMOCOUPLES; THIN FILMS;

THERMAL SENSORS; X RAY EXPOSURE;

X RAY LITHOGRAPHY;

EID: 0030400371     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.250950     Document Type: Conference Paper

References (16)