Three-dimensional numerical model for thermal analysis in x-ray irradiated photoresists

Numerical Heat Transfer; Part A: Applications

Volumn 31, Issue 6, 1997, Pages 585-595

  Dai, W ^a   Nassar, R ^a   Warrington, R O ^b   Shen, B ^b  

^a Louisiana Tech University   (United States)

^b LOUISIANA TECH UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTATIONAL METHODS; INTERFACES (MATERIALS); MATHEMATICAL MODELS; TEMPERATURE DISTRIBUTION; THERMOANALYSIS; X RAY LITHOGRAPHY;

DOMAIN DECOMPOSITION ALGORITHM; DOUGLAS ALTERNATING DIRECTION IMPLICIT (ADI) SCHEME;

PHOTORESISTS;

EID: 0031560741     PISSN: 10407782     EISSN: 15210634     Source Type: Journal    
DOI: 10.1080/10407789708914054     Document Type: Article

References (7)

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