Three-dimensional numerical model for thermal analysis in x-ray irradiated photoresists with cylindrical domain

Numerical Heat Transfer; Part A: Applications

Volumn 32, Issue 5, 1997, Pages 517-530

  Dai, W ^a   Nassar, R ^a  

^a Louisiana Tech University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FINITE ELEMENT METHOD; IRRADIATION; MATHEMATICAL MODELS; TEMPERATURE DISTRIBUTION; X RAYS;

THERMAL ANALYSIS;

PHOTORESISTS;

EID: 0031248596     PISSN: 10407782     EISSN: 15210634     Source Type: Journal    
DOI: 10.1080/10407789708913904     Document Type: Article

References (8)

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5. W. Dai, R. Nassar, R. O. Warrington, and B. Shen, Three-Dimensional Numerical Models for Thermal Analysis in X-Ray Irradiated Photoresists, Numer. Heat Transfer Part A, vol. 31, pp. 585-595, 1997.
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