Accuracy of structure transfer in deep X-ray lithography

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 557-560

  Feiertag, G ^a   Ehrfeld, W ^a   Lehr, H ^a   Schmidt, A ^a   Schmidt, M ^a  

^a INSTITUT FÜR MIKROTECHNIK MAINZ GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; ELECTROMAGNETIC WAVE SCATTERING; FLUORESCENCE; MASKS; MATHEMATICAL MODELS; PHOTORESISTS; PLASTIC FILMS; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

ABSORBER EDGE; BEAM DIVERGENCE; DEEP X RAY LITHOGRAPHY; FRESNEL DIFFRACTION; MASK MEMBRANE; MICROFABRICATION; STRUCTURE TRANSFER ACCURACY;

MICROELECTRONIC PROCESSING;

EID: 0031073198     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00158-X     Document Type: Article

References (10)

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