Parameters for feature evolution models in plasma etching from molecular dynamics simulation

Materials Research Society Symposium - Proceedings

Volumn 389, Issue , 1995, Pages 23-28

  Helmer, B A ^a   Graves, D B ^a   Barone, M E ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LEVELS; FLUORINE COMPOUNDS; MOLECULAR DYNAMICS; PROBABILITY; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MODELS; SURFACES;

FEATURE EVOLUTION MODELS; STICKING PROBABILITY; SURFACE COVERAGE;

PLASMA ETCHING;

EID: 0029179370     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-389-23     Document Type: Conference Paper

References (5)