Site balance models in plasma processing: A comparison to molecular dynamics simulations

Materials Research Society Symposium - Proceedings

Volumn 389, Issue , 1995, Pages 29-34

  Barone, M E ^a   Graves, D B ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINATION; CHLORINE; MATHEMATICAL MODELS; MOLECULAR DYNAMICS; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; SURFACE TREATMENT;

ION ASSISTED ETCHING; SITE BALANCE MODELS;

PLASMA ETCHING;

EID: 0029201487     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-389-29     Document Type: Conference Paper

References (8)