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Volumn 7, Issue 4, 1998, Pages 607-616

Mass spectrometric investigations on CH4 plasmas obtained from a dual electron cyclotron resonance-radio frequency discharge

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; ELECTRON CYCLOTRON RESONANCE; MASS SPECTROMETERS; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; THIN FILMS;

EID: 0032204594     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/7/4/018     Document Type: Article
Times cited : (30)

References (45)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.