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Volumn 5, Issue 3-5, 1996, Pages 425-428
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Temperature dependence of the formation of highly tetrahedral a-C:H
a a a a b b a c |
Author keywords
Highly tetrahedral a C:H; Ion beam deposition; Low pressure plasma beam; Substrate temperature
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Indexed keywords
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EID: 0041374767
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/0925-9635(95)00461-0 Document Type: Article |
Times cited : (28)
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References (21)
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