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Applied Surface Science

Volumn 130-132, Issue , 1998, Pages 781-785

Self-organization of nanoscale Ge islands in Si/Ge/Si(113) multilayers

(2) Omi, Hiroo a Ogino, Toshio a

a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR BEAM EPITAXY; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SEMICONDUCTOR SUPERLATTICES; SUBSTRATES; THERMAL EFFECTS;

NANOSCALE GERMANIUM ISLANDS;

NANOSTRUCTURED MATERIALS;

EID: 0032099131 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(98)00154-8 Document Type: Article

Times cited : (9)

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