Crystalline SiC thin film deposition by laser ablation: Influence of laser surface activation

Applied Physics A: Materials Science and Processing

Volumn 66, Issue 2, 1998, Pages 183-187

  Diegel, M ^a   Falk, F ^a   Hergt, R ^a   Hobert, H ^b   Stafast, H ^a,b  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; DEPOSITION; FILM GROWTH; FILM PREPARATION; FUSED SILICA; LASER ABLATION; SILICON WAFERS; THERMAL EFFECTS; THIN FILMS; YTTRIUM COMPOUNDS;

LASER SURFACE ACTIVATION;

SILICON CARBIDE;

EID: 0032000572     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390050653     Document Type: Article

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