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Volumn 30, Issue 17, 1997, Pages 2411-2420

Distinguishing the effects of oxide trapped charges and interface states in DDD and LATID nMOSFETs using photon emission spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; EMISSION SPECTROSCOPY; HOT CARRIERS; INTERFACES (MATERIALS); LIGHT EMISSION; LIGHT SCATTERING; PHOTONS; SUBSTRATES;

EID: 0031558465     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/30/17/007     Document Type: Article
Times cited : (2)

References (17)
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    • Leang S E, Chan D S H and Chim W K 1996 New purely-experimental technique for extracting the spatial distribution of hot-carrier-induced interface states and trapped charges in MOSFETs Proc. 1996 IEEE Int. Reliability Physics Symp. (Dallas, 30 April-2 May 1996) pp 311-7
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    • Doyle B, Bourcerie M, Marchetaux J C and Boudou A 1990 Interface state creation and charge trapping in the medium-to-high gate voltage range during hot-carrier stressing of n-MOS transistors IEEE Trans. Electron. Dev. 37 (3) 744-54
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.