Optical properties of large area diffractive Fresnel-lenses with modified zone-geometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2863, Issue , 1996, Pages 111-121

  Zeitner, Uwe D ^a   Kley, E Bernhard ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Electron beam lithography; Fresnel lens; Micro lithography

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; GEOMETRY; OPTICAL DESIGN; OPTICAL ENGINEERING; OPTICAL INSTRUMENT LENSES;

DIFFRACTIVE LENS; EXPOSURE-TIME; FRESNEL LENS; LENS ARRAY; LENS GEOMETRY; SPECIAL SURFACES;

OPTICAL PROPERTIES;

EID: 0041687378     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.256214     Document Type: Conference Paper

References (6)

1. E.-B. Kley, German Patent No. DE 43 14 574 Al.
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3. D. W. Ricks: "Scattering from diffractive optics", Diflfractive and Miniaturized Optics, SPIE Vol. CR49, pp 187-211 (1994).
4. D. A. Buralli, G. M. Morris, J. R. Rogers: "Optical performance of holographic kinoforms", Applied Optics, Vol. 28, No. 5 (1.3. 1989).
5. E.-B. Kley, B. Schnabel, "E-beam lithography: a suitable technology for fabrication of high-accuracy 2D and 3D surface profiles", Microlithography and Metrology in Micromechaning, Austin, October 1995, SPIE Proceedings Vol. 2640
6. U. D. Zeitner: "Untersuchungen an grossflachigen Fresnellinsen", Thesis for Diploma, University of Jena (1995).