Application of metallic subwavelength gratings for polarization devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2863, Issue , 1996, Pages 166-174

  Kley, E B ^a   Schnabel, B ^a   Hubner H ^a   Zeitner, U D ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

E beam lithography; Microoptics; Polarimeter; Polarization; Spectrometer; Subwavelength gratings

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; LIGHT POLARIZATION; MICROOPTICS; OPTICAL DESIGN; OPTICAL ENGINEERING; POLARIMETERS; POLARIZATION; SPECTROMETERS;

E-BEAM LITHOGRAPHY; MICRO-OPTICAL ELEMENTS; PARAMETERS ESTIMATED; POLARIZATION DEVICES; POLARIZATION PROPERTIES; SPECTROSCOPIC PROPERTY; SUB-WAVE LENGTH GRATING; WAVELENGTH RESOLUTION;

DIFFRACTION GRATINGS;

EID: 0041687383     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.256221     Document Type: Conference Paper

References (7)

1. E.-B. Kley, "Oberflächenprofile für Profilmasken der integrierten Optik und Mikrooptik", VDI Berichte Nr. 1102, 1993, VDI-Verlag GmbH Düsseldorf 1993
2. B. Stenkamp, M. Abraham, W. Ehrfeld, E. Knapek, M. Hintermaier, M. T. Gale, R. Morf, "Grid polarizer for the visible spectral region", SPIE Proceedings Vol. 2213
3. E.-B. Kley, P. Thieme, B. Schnabel, M. Bottcher, R. Plontke, "Elektronenstrahl-lithografische Submikron- und Nanometerstrukturierung mit Energien zwischen 1 und 20 keV", VDI Berichte Nr. 1172, 1994, VDI Verlag Düsseldorf 1994
4. E.-B. Kley, B. Schnabel, "E-beam lithography: a suitable technology for fabrication of highaccuracy 2D and 3D surface profiles", Microlithography and Metrology in Micromaching, Austin, October 1995, SPIE Proceedings Vol. 2640
5. E.-B. Kley, B. Schnabel, U. D. Zeitner, H. Hübner, W. Rockstroh, "Fabrication of elements for microoptics and integrated optics by e-beam direct writing", EOS Topical Meeting: Free Space Optical Systems, Engelberg (Switzerland), April 1996
6. Patent No. DE 196 21 512.9; DE 196 21 513.7
7. © and other polymers", International symposium on lasers, optics and vision for productivity in manufacturing, Besancon (France), June 1996