Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms

Applied Optics

Volumn 34, Issue 5, 1995, Pages 897-903

  Nikolajeff, Fredrik ^a   Bengtsson, Jörgen ^a   Larsson, Michael ^a   Ekberg, Mats ^a   Hård, Sverker ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

Direct write electron beam lithography; Kinoform; Proximity effect; Successive development

Indexed keywords

COMPUTER APPLICATIONS; DIFFRACTION GRATINGS; ELECTROMAGNETIC WAVE DIFFRACTION; ELECTRON BEAM LITHOGRAPHY; NUMERICAL ANALYSIS;

KINOFORM; PROXIMITY EFFECTS;

HOLOGRAPHY;

EID: 0029253099     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.34.000897     Document Type: Article

References (4)

1. P. D. Maker and R. E. Muller, "Phase holograms in polymethyl methacrylate, " J. Vac. Sci. Technol. B 10, 2516-2519 (1992).
2. M. Larsson, M. Ekberg, F. Nikolajeff, and S. Hård, "Successive development optimization of resist kinoforms manufactured with direct-writing electron-beam lithography, " Appl. Opt. 33, 1176-1179 (1994).
3. M. Ekberg, F. Nikolajeff, M. Larsson, and S. Hård, "Proximity-compensated transmission grating manufactured with direct-writing electron-beam lithography, " Appl. Opt. 33, 103-107 (1994).
4. G. Owen, "Methods for proximity effect correction in electron lithography, " J. Vac. Sci. Technol. B 8, 1889-1892 (1990).