E-beam lithography: a suitable technology for fabrication of high-accuracy 2D and 3D surface profiles

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2640, Issue , 1995, Pages 71-80

  Kley, Ernst Bernhard ^a   Schnabel, B ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM WRITING; SURFACE PROFILES; VARIABLE ENERGY WRITING;

FABRICATION; MICROMACHINING; SURFACES; THREE DIMENSIONAL;

ELECTRON BEAM LITHOGRAPHY;

EID: 0029519296     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)