EXTIGATE: The ultimate process architecture for submicron CMOS technologies

IEEE Transactions on Electron Devices

Volumn 44, Issue 11, 1997, Pages 2070-2077

  Schwalke, Udo ^a,b   Kerber, Martin ^a,b   Koller, Klaus ^a,b   Jacobs, Hermann J ^b  

^a IEEE   (Germany)

^b SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

GATES (TRANSISTOR); INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY;

EXTENDED TRENCH ISOLATION GATE TECHNOLOGY (EXTIGATE); SHALLOW TRENCH ISOLATION (STI);

CMOS INTEGRATED CIRCUITS;

EID: 0031277336     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.641386     Document Type: Article

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