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Volumn 38, Issue 8, 1991, Pages 1905-1912

Physical Understanding of Low-Field Carrier Mobility in Silicon MOSFET Inversion Layer

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONS; PHONONS; SEMICONDUCTOR DEVICES, MOSFET;

EID: 0026205305     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.119032     Document Type: Article
Times cited : (63)

References (22)
  • 1
    • 36049059178 scopus 로고
    • Transport properties of electrons in inverted silicon surfaces
    • F. F. Fang and A. B. Fowler, “Transport properties of electrons in inverted silicon surfaces,” Phys. Rev., vol. 169. no.: 3, pp. 619–631, 1968.
    • (1968) Phys. Rev. , vol.169 , Issue.3 , pp. 619-631
    • Fang, F.F.1    Fowler, A.B.2
  • 2
    • 35949038635 scopus 로고
    • Mobility anisotrophy of electrons in inversion layers on oxidized silicon surfaces
    • T. Sato, Y. Takeishi, H. Hara, and Y. Okamoto, “Mobility anisotrophy of electrons in inversion layers on oxidized silicon surfaces,” Phys. Rev., vol. 4, no. 6, pp. 1950–1960, 1971.
    • (1971) Phys. Rev. , vol.4 , Issue.6 , pp. 1950-1960
    • Sato, T.1    Takeishi, Y.2    Hara, H.3    Okamoto, Y.4
  • 3
    • 0018683243 scopus 로고
    • Characterization of electron mobility in the inverted (100) surface
    • A. G. Sabnis and J. T. Clemens, “Characterization of electron mobility in the inverted (100) surface,” in IEDM Tech. Dig., 1979, pp. 18–21.
    • (1979) IEDM Tech. Dig. , pp. 18-21
    • Sabnis, A.G.1    Clemens, J.T.2
  • 4
    • 0019048875 scopus 로고
    • Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces
    • S. C. Sun and J. D. Plummer, “Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces,” IEEE Trans. Electron Devices, vol. ED-27, no. 8, pp. 1497–1508, 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , Issue.8 , pp. 1497-1508
    • Sun, S.C.1    Plummer, J.D.2
  • 6
    • 0023596537 scopus 로고
    • Universal mobility-field curves for electrons and holes in MOS inversion layers
    • J. T. Watt and J. D. Plummer, “Universal mobility-field curves for electrons and holes in MOS inversion layers,” in Proc. Symp. VLSI Tech., 1987, p. 81.
    • (1987) Proc. Symp. VLSI Tech. , pp. 81
    • Watt, J.T.1    Plummer, J.D.2
  • 7
    • 49349140650 scopus 로고
    • On the role of scattering by surface roughness in silicon inversion layers
    • Y. C. Cheng and E. A. Sullivan, “On the role of scattering by surface roughness in silicon inversion layers,” Surf. Sci., vol. 34, pp. 717–731, 1973.
    • (1973) Surf. Sci. , vol.34 , pp. 717-731
    • Cheng, Y.C.1    Sullivan, E.A.2
  • 8
    • 85032069152 scopus 로고
    • Electronic properties of two dimensional systems
    • T. Ando, A. B. Fowler, and F. Stern, “Electronic properties of two dimensional systems,” Rev. Mod. Phys., vol. 54, pp. 437–672, 1982.
    • (1982) Rev. Mod. Phys. , vol.54 , pp. 437-672
    • Ando, T.1    Fowler, A.B.2    Stern, F.3
  • 9
    • 0020918485 scopus 로고
    • Semi-empirical solution for electron velocity in Si: Part II—MOS inversion layers
    • S. A. Schwarz and S. E. Russek, “Semi-empirical solution for electron velocity in Si: Part II—MOS inversion layers,” IEEE Trans. Electron Devices, vol. ED-30, pp. 1634–1639, 1983.
    • (1983) IEEE Trans. Electron Devices , vol.ED-30 , pp. 1634-1639
    • Schwarz, S.A.1    Russek, S.E.2
  • 10
    • 0025430936 scopus 로고
    • Measurement and modeling of the n-channel MOSFET inversion layer mobility and device characteristics in the temperature range 60 – 300 K
    • C. L. Huang and G. Sh. Gildenblat, “Measurement and modeling of the n-channel MOSFET inversion layer mobility and device characteristics in the temperature range 60 – 300 K,” IEEE Trans. Electron Devices, vol. 37, no. 5, pp. 1289–1300, 1990.
    • (1990) IEEE Trans. Electron Devices , vol.37 , Issue.5 , pp. 1289-1300
    • Huang, C.L.1    Gildenblat, G.S.2
  • 11
    • 34547827353 scopus 로고
    • Properties of semiconductors surface inversion layers in the electrical quantum limit
    • F. Stem and W. E. Howard, “Properties of semiconductors surface inversion layers in the electrical quantum limit,” Phys. Rev., vol. 163, no. 3, pp. 816–835, 1967.
    • (1967) Phys. Rev. , vol.163 , Issue.3 , pp. 816-835
    • Stem, F.1    Howard, W.E.2
  • 12
    • 84954698077 scopus 로고
    • Quantum properties of surface space-charge layers
    • F. Stem, “Quantum properties of surface space-charge layers,” CRC Crit. Rev. Solid State Sci., pp. 499–512, 1974.
    • (1974) CRC Crit. Rev. Solid State Sci. , pp. 499-512
    • Stem, F.1
  • 13
    • 0016092027 scopus 로고
    • The diffuse scattering model of effective mobility in the strongly inverted layer of MOS transistors
    • G. Baccarani, A. M. Mazzone, and C. Morandi, “The diffuse scattering model of effective mobility in the strongly inverted layer of MOS transistors,” Solid-State Electron., vol. 17, pp. 785–789, 1974.
    • (1974) Solid-State Electron. , vol.17 , pp. 785-789
    • Baccarani, G.1    Mazzone, A.M.2    Morandi, C.3
  • 14
    • 0023292564 scopus 로고
    • A physically based mobility model for MOSFET numerical simulation
    • T. Nishida and C. T. Sah, “A physically based mobility model for MOSFET numerical simulation,” IEEE Trans. Electron Devices, vol. ED-34, no. 2, pp. 310–320, 1987.
    • (1987) IEEE Trans. Electron Devices , vol.ED-34 , Issue.2 , pp. 310-320
    • Nishida, T.1    Sah, C.T.2
  • 15
    • 0004457553 scopus 로고
    • Electron energy levels in GaAs-Ga1-xAlxAs heterojunctions
    • F. Stem and S. D. Sarma, “Electron energy levels in GaAs-Ga1-xAlxAs heterojunctions,” Phys. Rev. B, vo. 30, pp. 840–848, 1984.
    • (1984) Phys. Rev. B, vo , vol.30 , pp. 840-848
    • Stem, F.1    Sarma, S.D.2
  • 16
    • 0025251482 scopus 로고
    • Unified charge control model and subthreshold current in heterostructure field-effect transistors
    • Y. H. Byun, K. Lee, and M. Shur, “Unified charge control model and subthreshold current in heterostructure field-effect transistors,” IEEE Elect. Device Lett., vol. 11, no. 1, pp. 50–53, 1990.
    • (1990) IEEE Elect. Device Lett. , vol.11 , Issue.1 , pp. 50-53
    • Byun, Y.H.1    Lee, K.2    Shur, M.3
  • 17
    • 0016034951 scopus 로고
    • Hot carriers in silicon surface inversion layers
    • K. Hess and C. T. Sah, “Hot carriers in silicon surface inversion layers,” J. Appl. Phys., vol. 45, no. 3, pp. 1254–1257, 1974.
    • (1974) J. Appl. Phys. , vol.45 , Issue.3 , pp. 1254-1257
    • Hess, K.1    Sah, C.T.2
  • 18
    • 0019664378 scopus 로고
    • A unified model for hot-electron currents in MOSFETs
    • P. K. Ko, R. S. Muller, and C. Hu, “A unified model for hot-electron currents in MOSFETs,” in IEDM Tech. Dig., 1983, pp. 600–603.
    • (1983) IEDM Tech. Dig. , pp. 600-603
    • Ko, P.K.1    Muller, R.S.2    Hu, C.3
  • 19
    • 84941864144 scopus 로고
    • Study on the degradation of electron and hole’s surface mobility by Si/Si02 interface roughness
    • Korea Advanced Institute of Science and Technology, Seoul, July
    • S. P. Sim, “Study on the degradation of electron and hole’s surface mobility by Si/Si02 interface roughness,” M.S.E.E. thesis, Korea Advanced Institute of Science and Technology, Seoul, July 1990.
    • (1990) M.S.E.E. thesis
    • Sim, S.P.1
  • 20
    • 0020186076 scopus 로고
    • Charge accumulation and mobility in thin dielectric MOS transistors
    • C. G. Sodini, T. W. Ekstedt, and J. L. Moll, “Charge accumulation and mobility in thin dielectric MOS transistors,” Solid-State Electron., vol. 25, no. 9, pp. 833–841, 1982.
    • (1982) Solid-State Electron. , vol.25 , Issue.9 , pp. 833-841
    • Sodini, C.G.1    Ekstedt, T.W.2    Moll, J.L.3
  • 21
    • 0022738197 scopus 로고
    • High-mobility FET in strained silicon
    • R. W. Keyes, “High-mobility FET in strained silicon,” IEEE Trans. Electron Devices, vol. ED-33, no. 6, p. 863, 1986.
    • (1986) IEEE Trans. Electron Devices , vol.ED-33 , Issue.6 , pp. 863
    • Keyes, R.W.1
  • 22
    • 36549092398 scopus 로고
    • Uniaxial stress dependence of current-voltage dependence in GaAs-AlGaAs-GaAs heterojunction barrier
    • S. S. Lu, K. Lee, M. I. Nathan, M. Heiblum, and S. L. Wright, “Uniaxial stress dependence of current-voltage dependence in GaAs-AlGaAs-GaAs heterojunction barrier,” Appl. Phys. Lett., vol. 55, no. 13, p. 1336, 1989.
    • (1989) Appl. Phys. Lett. , vol.55 , Issue.13 , pp. 1336
    • Lu, S.S.1    Lee, K.2    Nathan, M.I.3    Heiblum, M.4    Wright, S.L.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.