Analysis of the delay distributions of 0.5 jm,m soi lsis

IEICE Transactions on Electronics

Volumn E80-C, Issue 3, 1997, Pages 464-469

  Iwamatsui, Toshiaki ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Adder; Divider; High speed; Low voltage; SIMOX; SOI

Indexed keywords

ADDERS; COMPUTER SIMULATION; ENERGY UTILIZATION; FREQUENCY DIVIDING CIRCUITS; INTEGRATED CIRCUIT LAYOUT; INTEGRATED CIRCUIT MANUFACTURE; ION IMPLANTATION; SEMICONDUCTOR DEVICE STRUCTURES; SILICON ON INSULATOR TECHNOLOGY; TRANSISTORS;

CIRCUIT SIMULATOR; SEPARATION BY IMPLANTED OXYGEN SUBSTRATE; WET ETCHING;

LSI CIRCUITS;

EID: 0031102260     PISSN: 09168524     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (14)

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