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Volumn 43, Issue 12, 1996, Pages 2164-2171

Sensitivity of subthreshold current to profile variations in long-channel MOSFET's

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DIELECTRIC PROPERTIES; ELECTRIC CURRENTS; IONS; OXIDES; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SENSITIVITY ANALYSIS; SURFACE MEASUREMENT;

EID: 0030420165     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.544387     Document Type: Article
Times cited : (8)

References (10)
  • 1
    • 0029321702 scopus 로고    scopus 로고
    • "The effect of doping profile variations upon deep submicrometer MOSFET's," Microelectron. Eng
    • vol. 28, pp. 155-161, 1995.
    • J. R. Brews, Z. Zhou, and J. Buxo, "The effect of doping profile variations upon deep submicrometer MOSFET's," Microelectron. Eng., vol. 28, pp. 155-161, 1995.
    • Z. Zhou, and J. Buxo
    • Brews, J.R.1
  • 2
    • 0038429285 scopus 로고    scopus 로고
    • "Dopant profile control and metrology requirements for sub 0.5 micron MOSFET's,"
    • vol. 14, no. 1, pp. 218-223, 1996.
    • M. Duane, P. Nunan, M. ter Beck, and R. Subrahmanyan, "Dopant profile control and metrology requirements for sub 0.5 micron MOSFET's," J. Vac. Sci. Technol. B, vol. 14, no. 1, pp. 218-223, 1996.
    • J. Vac. Sci. Technol. B
    • Duane, M.1    Nunan, P.2    Ter Beck, M.3    Subrahmanyan, R.4
  • 5
    • 0030150045 scopus 로고    scopus 로고
    • "Analytical threshold voltage model for short channel double-gate SOI MOSFET's,"
    • vol. 43, pp. 1166-1168, July 1996.
    • K. Suzuki, Y. Tosaka, and T. Sugii, "Analytical threshold voltage model for short channel double-gate SOI MOSFET's," IEEE Trans. Electron Devices, vol. 43, pp. 1166-1168, July 1996.
    • IEEE Trans. Electron Devices
    • Suzuki, K.1    Tosaka, Y.2    Sugii, T.3
  • 7
    • 0029535948 scopus 로고    scopus 로고
    • "Device drive current degradation observed with retrograde channel profiles," IEDM
    • 419-421, 1995.
    • S. Venkatesan, J. W. Lutze, C. Lage and W. J. Taylor, "Device drive current degradation observed with retrograde channel profiles," IEDM Tech. Dig., pp. 419-421, 1995.
    • Tech. Dig., Pp.
    • Venkatesan, S.1    Lutze, J.W.2    Lage, C.3    Taylor, W.J.4
  • 8
    • 0018517266 scopus 로고    scopus 로고
    • "Subthreshold behavior of uniformly and nonuniformly doped long-channel MOSFET,"
    • 26, pp. 1282-1291, Sept. 1979.
    • J. R. Brews, "Subthreshold behavior of uniformly and nonuniformly doped long-channel MOSFET," IEEE Trans. Electron Devices, vol. ED-26, pp. 1282-1291, Sept. 1979.
    • IEEE Trans. Electron Devices, Vol. ED
    • Brews, J.R.1
  • 9
    • 0026852922 scopus 로고    scopus 로고
    • "Influence of high substrate doping levels on the threshold voltage and the mobility of deep-submicrometer MOSFET's,"
    • vol. 39, pp. 932-938, 1992.
    • M. J. van Dort, P. H. Woerlee, A. J. Walker, C. A. H. Jufrermans and H. Lifka, "Influence of high substrate doping levels on the threshold voltage and the mobility of deep-submicrometer MOSFET's," IEEE Trans. Electron Devices, vol. 39, pp. 932-938, 1992.
    • IEEE Trans. Electron Devices
    • Van Dort, M.J.1    Woerlee, P.H.2    Walker, A.J.3    Jufrermans, C.A.H.4    Lifka, H.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.