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Volumn E79-C, Issue 4, 1996, Pages 593-596

Lateral IGBT structure on the SOI film with the collector-short region for improved blocking capability

Author keywords

Blocking capability; Collector short region; Leakage current; LIGBT; SOI

Indexed keywords

CHARGE CARRIERS; DIFFUSION IN SOLIDS; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRIC FIELDS; LEAKAGE CURRENTS; SEMICONDUCTING FILMS; SEMICONDUCTOR DEVICE STRUCTURES; SILICON ON INSULATOR TECHNOLOGY;

EID: 0030121660     PISSN: 09168524     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (3)

References (11)
  • 7
    • 0025531213 scopus 로고    scopus 로고
    • 500 V output device structures for thin silicon layer on silicon dioxide film," Proc. ISPSD, pp. 97-101, 1990.
    • A. Nakagawa, N. Yasuhara, and Y. Baba, "New 500 V output device structures for thin silicon layer on silicon dioxide film," Proc. ISPSD, pp. 97-101, 1990.
    • N. Yasuhara, and Y. Baba, "New
    • Nakagawa, A.1
  • 9
    • 0027813433 scopus 로고    scopus 로고
    • 200°C high-temperature and high-speed operation of 440 V lateral IGBTs on 1. 5 μm thick SOI," 1993 IEEE IEDM Tech. Dig. , pp. 687-690.
    • A. Nakagawa, Y. Yamaguchi, T. Matsudai, and N. Yasuhara, "200°C high-temperature and high-speed operation of 440 V lateral IGBTs on 1. 5 μm thick SOI," 1993 IEEE IEDM Tech. Dig. , pp. 687-690.
    • Y. Yamaguchi, T. Matsudai, and N. Yasuhara, "
    • Nakagawa, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.