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Applied Physics A: Materials Science and Processing

Volumn 74, Issue 1, 2002, Pages 27-33

Laser conditioning and nonlinear absorption of LaF3/MgF 2 dielectric multilayers at 193 nm

(3) Li, B a,b Martin, S a Welsch, E a

a FRIEDRICH SCHILLER UNIVERSITY JENA (Germany)

b UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; DIELECTRIC MATERIALS; LENSES; MULTILAYERS; SENSITIVITY ANALYSIS; SUBSTRATES;

ABSORPTION COEFFICIENTS; DIELECTRIC MULTILAYERS; LASER CONDITIONING; THERMAL LENS (TL);

LANTHANUM COMPOUNDS;

EID: 0012422175 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390100867 Document Type: Review

Times cited : (8)

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