Calorimetric measurements of optical materials for 193 nm lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4184-4187

  Grenville, A ^a,d   Uttaro, R ^b   Sedlacek, J H C ^b   Rothschild, M ^b   Corliss, D ^c  

^a INTEL CORPORATION   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^c SEMATECH   (United States)

^d MIT LINCOLN LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4344706914     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588617     Document Type: Article

References (7)

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