Changes in optical interference coatings exposed to 193 nm excimer laser radiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3578, Issue , 1999, Pages 83-96

  Heber, J ^a   Thielsch, R ^a   Blaschke, H ^a   Kaiser, N ^a   Leinhos, U ^a   Goertler, A ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; CALCIUM COMPOUNDS; DEGRADATION; DEPOSITION; EVAPORATION; EXCIMER LASERS; FUSED SILICA; LASER DAMAGE; LIGHT INTERFERENCE; REFLECTIVE COATINGS; SUBSTRATES; ULTRAVIOLET RADIATION;

CALCIUM FLUORIDE; DEEP ULTRAVIOLET COATINGS; ULTRAVIOLET CONDITIONING; ULTRAVIOLET DEGRADATION;

OPTICAL FILMS;

EID: 0032679794     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.344384     Document Type: Conference Paper

References (24)