Composition and tribological characterization of chemically vapour-deposited TiN layer

Surface and Coatings Technology

Volumn 100-101, Issue 1-3, 1998, Pages 146-148

  Fouilland, L ^a   Imhoff, L ^a   Bouteville, A ^a   Benayoun, S ^a   Remy, J C ^a   Perriere J ^b   Morcrette, M ^b  

^a ARTS ET MÉTIERS PARISTECH   (France)

^b Groupe de Physique du Solide   (France)

Author keywords

Chemical vapour deposition; Titanium nitride; Tribological properties

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DENSITY (SPECIFIC GRAVITY); FRICTION; IMPURITIES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SPECTROMETRY; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; TRIBOLOGY; WEAR OF MATERIALS;

FRICTION COEFFICIENT; LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); MICRO SCRATCH TESTS; PIN ON DISC TRIBOMETER;

TITANIUM NITRIDE;

EID: 0032021745     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00604-X     Document Type: Article

References (8)

1. Manuel des traitements de surface, CETIM, 1987, p. II-211.
2. J. Takadoum, H. Houmid Bennani, M. Allouard, Surf. Coat. Technol. 88 (1996) 232-238.
3. S. Hogmark, P. Hedenqvist, Wear 179 (1994) 147-154.
4. Y.Y. Guu, J.F. Lin, Surf. Coat. Technol. 85 (1996) 146-155.
5. L. Imhoff, A. Bouteville, J.C. Remy, submitted to J. Electrochem. Soc.
6. M.J. Buiting, A.F. Otterloo, J. Electrochem. Soc. 139 (1992) 2580.
7. F. Attar, T. Johannesson, Surf. Coat. Technol. 78 (1996) 87-102.
8. A. Bouteville, L. Imhoff, J.C. Remy, J. Electrochem. Soc. 143 (1996) 3251-3256.