An experimental study of chemical vapour deposition of tungsten on Ti/TiN adhesion bilayers: Mechanical properties

Surface and Coatings Technology

Volumn 99, Issue 3, 1998, Pages 274-280

  Mouroux, A ^a   Zhang, S L ^a   Petersson, C S ^a   Palmans, R ^b   Maex, K ^b   Ahlgren, T ^c   Keinonen, J ^c  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b IMEC   (Belgium)

^c UNIVERSITY OF HELSINKI   (Finland)

Author keywords

CVD W; Impurity; Nucleation; Stress; Ti TiN

Indexed keywords

ADHESION; ANNEALING; GROWTH (MATERIALS); IMPURITIES; INTERFACES (MATERIALS); MECHANICAL PROPERTIES; NUCLEATION; THERMODYNAMICS; TITANIUM; TITANIUM NITRIDE; TUNGSTEN;

ADHESION BILAYERS;

CHEMICAL VAPOR DEPOSITION;

EID: 0031998362     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00567-7     Document Type: Article

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