Anti-oxidation properties of TiAlN film prepared by plasma-assisted chemical vapor deposition and roles of Al

Thin Solid Films

Volumn 307, Issue 1-2, 1997, Pages 113-119

  Kim, Chung Wan ^a   Kim, Kwang Ho ^a  

^a Pusan National University   (South Korea)

Author keywords

Aluminum; Oxidation; Surface segregation; Titanium nitride

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; DIFFUSION IN GASES; OXIDATION; OXIDATION RESISTANCE; PLASMA APPLICATIONS; TITANIUM NITRIDE;

PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION;

PROTECTIVE COATINGS;

EID: 0031247999     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00212-5     Document Type: Article

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