Three-dimensional deposition of TiN film using low frequency (50 Hz) plasma chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 4, 1997, Pages 1897-1901

  Shimozuma, M ^a   Date, H ^a   Iwasaki, T ^a   Tagashira, H ^a   Yoshino, M ^b   Yoshida, K ^c  

^a HOKKAIDO UNIVERSITY   (Japan)

^b HOKKAIDO POLYTECHNIC COLLEGE   (Japan)

^c KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031521783     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580657     Document Type: Article

References (8)

1. R. Buhl, H. K. Pulker, and E. Moll, Thin Solid Films 80, 265 (1981).
2. A. Sherman, Jpn. J. Appl. Phys. 30, 3553 (1991).
3. H. Hahn and W. Palich, J. Biomed Mater. Res. 4, 571 (1970).
4. D. H. Jang and J. S. Chun, Thin Solid Films 169, 57 (1989).
5. M. Shimozuma, K. Kitamori, H. Ohno, H. Haswgawa, and H. Tagashira, J. Electron. Mater. 14, 573 (1985).
6. M. Shimozuma, G. Tochitani, H. Ohno, and H. Tagashira, J. Appl. Phys. 66, 89 (1989).
7. G. Tochitani, M. Shimozuma, and H. Tagashira, J. Vac. Sci. Technol. A 11, 400 (1993).
8. K. Oguri, H. Fujita, and T. Arai, Thin Solid Films 195, 77 (1991).