Electron beam oxidation of shallow implants

Materials Science in Semiconductor Processing

Volumn 2, Issue 3, 1999, Pages 209-217

  Puga Lambers, M ^a   Lambers, E S ^b   Holloway, P H ^a,b  

^a UNIVERSITY OF FLORIDA   (United States)

^b University of Florida   (United States)

Author keywords

AES; Boron shallow implants; Electron beam irradiation; Electron beam stimulated oxidation; Oxygen backfill; Ripple formation; SIMS

Indexed keywords

EID: 0003314384     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(99)00020-7     Document Type: Article

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