Phase formation and strain relaxation during thermal reaction of Zr and Ti with strained Si1-x-yGexCy epilayers

Journal of Applied Physics

Volumn 88, Issue 3, 2000, Pages 1418-1423

  Aubry Fortuna, V ^a   Tremblay, G ^a   Meyer, F ^a   Miron, Y ^b   Roichman, Y ^b   Eizenberg, M ^b   Fortuna, F ^a   Hormann U ^c   Strunk, H ^c  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^c UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001633961     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.373833     Document Type: Article

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