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Volumn 133, Issue 1-2, 1998, Pages 148-151

Effect of H 2 dilution on the surface composition of plasma-deposited silicon films from SiH 4

(4) Marra, Denise C a Edelberg, Erik A a Naone, Ryan L a Aydil, Eray S a

a University of California (United States)

Author keywords

Amorphous silicon; Attenuated total reflection Fourier transform infrared spectroscopy; Nanocrystalline silicon; Plasma deposition

Indexed keywords

ABSORPTION SPECTROSCOPY; AMORPHOUS FILMS; COMPOSITION EFFECTS; CRYSTAL ORIENTATION; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; SEMICONDUCTING SILICON; SILANES; SURFACE STRUCTURE;

ATTENUATED TOTAL REFLECTION FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA DEPOSITION;

SEMICONDUCTING FILMS;

EID: 0031653574 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(98)00214-1 Document Type: Article

Times cited : (18)

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