New plasma source with an UHF (500 MHz) antenna

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 169-171

  Nakagawa, Y ^a   Samukawa, S ^b   Ueyama, H ^c   Tsukada, T ^a   Shinohara, K ^c  

^a Magnetic Thin Film Development Division Process Development Center General Business Headquarters   (Japan)

^b NEC CORPORATION   (Japan)

^c Nihon Koshuha Co Ltd   (Japan)

Author keywords

Fluorine; Optical spectroscopy; Plasma processing and deposition

Indexed keywords

ALUMINUM; ANTENNAS; CARBON INORGANIC COMPOUNDS; DEPOSITION; ELECTRONS; INTEGRATED CIRCUIT MANUFACTURE; OXYGEN; PLASMA DENSITY; PLASMA SOURCES; SPECTROSCOPIC ANALYSIS; ULSI CIRCUITS;

ETCH RATE; EXCITATION FREQUENCY; HELICON WAVE SOURCES; OPTICAL SPECTROSCOPY; PLASMA PROCESSING;

PLASMA DIAGNOSTICS;

EID: 0030217762     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08603-8     Document Type: Article

References (5)

1. T. Tsukada, H. Nogami, Y. Nakagawa and E. Wani, Jpn. J. Appl. Phys., 33 (1994) 4433.
2. S. Samukawa, Y. Nakagawa, T. Tsukada, H. Ueyamaand K. Shinohara, Appl. Phys. Lett., 67 (1995) 1414.
3. S. Samukawa, Y. Nakagawa, T. Tsukada, H. Ueyama and K. Shinohara, Digest of Papers of the 8th Int. MicroProcess Conf., The Japan Society of Applied Physics, Sendai, 1995, p. 150.
4. S. Samukawa, Y. Nakagawa, T. Tsukada, H. Ueyama and K. Shinohara, Jpn. J. Appl. Phys., 34 (1995) 6805.
5. R.J. Wenzel, IEEE. Trans. Microwave Theory and Tech., MTT-13 (1965) 559.