SCALPEL proof-of-concept system: Preliminary lithography results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 255-263

  Waskiewicz, W K ^a   Biddick, C J ^a   Blakey, M I ^a   Brady, K J ^a   Camarda, R M ^a   Connelly, W F ^a   Crorken, A H ^a   Custy, J P ^a   DeMarco, R ^a   Farrow, R C ^a   Felker, J A ^a   Fetter, L A ^a   Freeman, R ^a   Harriott, L R ^a   Hopkins, L C ^a   Huggins, H A ^a   Kasica, R J ^a   Knurek, C S ^a   Kraus, J S ^a   Liddle, J A ^a   Mkrtchyan, M M ^a   Novembre, A E ^a   Peabody, M L ^a   Rutberg, L ^a   Wade, H H ^a   Watson, G P ^a   Werder, K S ^a   Windt, D L ^a   Tarascon Auriol, R G ^b   Berger, S D ^c   Bowler, S W ^c   more..

^a LUCENT TECHNOLOGIES   (United States)

^b DUPONT COMPANY   (United States)

^c Integrated Solutions Inc   (United States)

Author keywords

E beam; Lithography; Mask; Process latitude; Resist

Indexed keywords

ELECTRON BEAMS; LITHOGRAPHY; MASKS;

E-BEAMS; INITIAL DESIGN; PROCESS LATITUDES; PROOF OF CONCEPT; RESIST;

ELECTRON BEAM LITHOGRAPHY;

EID: 0001117766     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275786     Document Type: Conference Paper

References (8)

1. L. R. Harriott, S. D. Berger, J. A. Liddle, G. P. Watson, M. M. Mkrtchyan, "Space charge effects in projection charged particle lithography systems", J. Vac. Sci. Technol. B, 13, 2404 (1995).
2. J. A. Liddle, S. D. Berger, C. J. Biddick, M. I. Blakey, K. J. Bolan, S. W. Bowler, K. Brady, R. M. Camarda, W. F. Connelly, A. Crorken, J. Custy, R. C. Farrow, J. A. Felker, L. A. Fetter, B. Freeman, L. R. Harriott, L. Hopkins, H. A. Huggins, C. S. Knurek, J. S. Kraus, D. A. Mixon, M. M. Mkrtcgyan, A. E. Novembre, M. L. Peabody, W. M. Simpson, R. G. Tarascon, H. H. Wade, W. K. Waskiewicz, G. P. Watson, J. K. Williams, D. L. Windt, "The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System", Jpn. J. Appl. Phys., 34, 6663 (1995).
3. L. Fetter, C. Biddick, M. Blakey, A. Liddle, M. Peabody, A. Novembre, D. Tennant, "Patterning of membrane masks for projection e-beam lithography", 16tzAnnualBACUS Symposium on Photomask Technology and Management-Proc. SPIE, 2884 (1996).
4. L. R. Harriott, S. D. Berger, C. Biddick, M. I. Blakey, S. W. Bowler, K. Brady, R. M. Camarda, W. F. Connelly, A. Crorken, J. Custy, R. Dimarco, R. C. Farrow, J. A. Felker, L. Fetter, R. Freeman, L. Hopkins, H. A. Huggins, C. S. Knurek, J. S. Kraus, J. A. Liddle, M. Mkrtchyan, A. E. Novembre, M. L. Peabody, R. G. Tarascon, H. H. Wade, W. K. Waskiewicz, G. P. Watson, K. S. Werder, D. Windt, "Preliminary results from a prototype projection electron-beam stepper-scattering with angular limitation projection electron beam lithography proof-of-concept system", J. Vac. Sci. Technol. B, 14, 3825 (1996).
5. A. E. Novembre, R. G. Tarascon, S. D. Berger, C. J. Biddick, M. I. Blakey, K. J. Bolan, L. A. Fetter, L. R. Harriott, H. A. Huggins, C. S. Knurek, J. A. Liddle, D. A. Mixon, M. L. Peabody, "Resist design considerations for direct write and projection electron-beam lithography technologies", J. Photopolymer Sci., Technol., 9, 663 (1996).
6. J. Xiao, J. Garofalo, R. Cirelli, S. Vaidya, "Effects of resist thickness and thin-film interference in I-line and deep ultraviolet optical lithography", J. Vac. Sci. Technol. B, 13, 2897 (1995);
7. R. A. Cirelli, G. R. Weber, A. Kornblit, R. M. Baker, F. P. Klemens, J. DeMarco, C. S. Pai,"A multilayer inorganic antireflective system for use in 248 nm deep ultraviolet lithography", J. Vac. Sci. Technol. B, 14, 4229 (1996).
8. G. P. Watson, D. Fu, S. D. Berger, D. Tennant, L. Fetter, A. Novembre, C. Biddick, "Measurement of the backscatter coefficient using resist response curves for 20-100 keV electron beam lithography on Si", J. Vac. Sci. Technol. B, 14,4277 (1996).