Characteristics of post-annealed SrTiO3 thin films prepared by mirror-confinement-type ECR plasma sputtering

Science and Technology of Advanced Materials

Volumn 1, Issue 4, 2000, Pages 211-217

  Baba, So ^a   Numata, Ken ^b   Miyake, Shoji ^a  

^a OSAKA UNIVERSITY   (Japan)

^b Kanagawa High Technology Foundation   (Japan)

Author keywords

Electromagnetic wave radiation; Low temperature synthesis; Mirror confinement type ECR plasma sputtering; Post annealing; SrTiO3

Indexed keywords

EID: 0001224049     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1468-6996(01)00006-7     Document Type: Article

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