|
|
|
Volumn 446, Issue , 1997, Pages 299-307
|
|
Tantalum pentoxide for advanced DRAM applications
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
ANNEALING;
CAPACITORS;
CHEMICAL VAPOR DEPOSITION;
ELECTRIC BREAKDOWN;
LEAKAGE CURRENTS;
NITROGEN OXIDES;
PERMITTIVITY;
RANDOM ACCESS STORAGE;
REACTION KINETICS;
STOICHIOMETRY;
TANTALUM COMPOUNDS;
TANTALUM PENTOXIDE;
THIN FILMS;
|
|
EID: 0030710728
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
|
Times cited : (8)
|
|
References (28)
|
