|
Volumn 14, Issue 2, 1996, Pages 346-351
|
Development of 111 texture in Al films grown on SiO2/Si(001) by ultrahigh-vacuum primary-ion deposition
a a a b |
Author keywords
[No Author keywords available]
|
Indexed keywords
ALUMINUM ALLOYS;
CRYSTAL MICROSTRUCTURE;
CRYSTAL ORIENTATION;
DEPOSITION;
GRAIN SIZE AND SHAPE;
IRRADIATION;
METALLIC FILMS;
RADIATION EFFECTS;
SEMICONDUCTING SILICON;
SILICA;
TEXTURES;
VACUUM APPLICATIONS;
LOW ENERGY SELF ION IRRADIATION;
PREFERRED ORIENTATION;
PRIMARY ION DEPOSITION;
FILM GROWTH;
|
EID: 0030109550
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.579899 Document Type: Article |
Times cited : (26)
|
References (17)
|