Across-wafer nonuniformity of long throw sputter deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 5, 1997, Pages 1788-1793

  Mayo, A A ^a   Hamaguchi, S ^a   Joo, J H ^b   Rossnagel, S M ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b Kunsan National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001201159     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589526     Document Type: Article

References (16)

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