Analysis of off-axis-shaped beam systems for high-throughput electron-beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3155, Issue , 1997, Pages 47-61

  Zhu, Xieqing ^a   Liu, Haoning ^a   Munro, Eric ^a   Rouse, John A ^a  

^a Munro's Electron Beam Software Ltd   (United Kingdom)

Author keywords

Aberration reduction; Aberration theory; Computer aided design; Dynamic corrections; Electron beam lithography; Optimization; Projection system; Shaped beam system

Indexed keywords

CHARGED PARTICLES; COMPUTER AIDED DESIGN; COMPUTER SOFTWARE; CURVE FITTING; DESIGN; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON GUNS; ELECTRONS; ERRORS; LEAST SQUARES APPROXIMATIONS; LENSES; OPTICAL INSTRUMENTS; OPTICAL PROJECTORS; OPTICAL PROPERTIES; PARTICLE BEAMS; PARTICLE OPTICS; PROGRAMMING THEORY; PROJECTION SYSTEMS;

ABERRATION REDUCTION; ABERRATION THEORY; DYNAMIC CORRECTIONS; OPTIMIZATION; PROJECTION SYSTEM; SHAPED BEAM SYSTEM;

ABERRATIONS;

EID: 0003036690     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.287818     Document Type: Conference Paper

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