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Applied Physics Letters

Volumn 77, Issue 13, 2000, Pages 2000-2002

Influence of carbon incorporation on dopant surface segregation in molecular-beam epitaxial growth of silicon

(4) Osten, H J a Lippert, G a Liu, J P a Kruger D a

a IHP (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001064641 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1312258 Document Type: Article

Times cited : (10)

References (18)

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