Carbon-induced undersaturation of silicon self-interstitials

Applied Physics Letters

Volumn 72, Issue 2, 1998, Pages 200-202

  Scholz, R ^a   Gosele U ^a   Huh, J Y ^b   Tan, T Y ^c  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b Korea University   (South Korea)

^c Duke University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001666794     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120684     Document Type: Article

References (14)

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