Structural properties of amorphous silicon-carbon films deposited by the filtered cathodic vacuum arc technique

Journal of Physics Condensed Matter

Volumn 11, Issue 26, 1999, Pages 5111-5118

  Shi, J R ^a   Shi, X ^a   Sun, Z ^a   Liu, E ^a   Yang, H S ^a   Cheah, L K ^a   Jin, X Z ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000474810     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/11/26/312     Document Type: Article

References (25)

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